Onye na-eweta ụlọ ọrụ mmepụta ihe/ọkwa elektrọnik TMAH 25% Tetramethylammonium Hydroxide

Nkọwa dị mkpirikpi:

Aha ngwaahịa: Tetramethylammonium hydroxide

CAS NO: 75-59-2

Ọdịdị: mmiri mmiri transperent enweghị agba

Nyocha: 25.0%

Nkwakọ ngwaahịa: 200kgs / drum

Tetramethylammonium hydroxide (TMAH ma ọ bụ TMAOH) bụ nnu ammonium quaternary nwere usoro molekụla [(CH3) 4N]+[OH] - na ọ bụ onye kachasị mfe na klas nke ogige ammonium organic quternary.Otu n'ime ụlọ ọrụ mmepụta ihe bụ maka anisotropic etching nke silicon.A na-ejikwa ya dị ka ihe mgbaze bụ isi na mmepe nke photoresist acidic na usoro fotolithography.Ebe ọ bụ ihe na-akpalite mbufe oge, ọ na-arụ ọrụ nke ukwuu n'iwepụ fotoresisist.A na-ejikwa ya dị ka surfactant na njikọ nke ferrofluid, iji gbochie agglomeration.

 

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Email: daisy@shxlchem.com

 


Nkọwa ngwaahịa

Mkpado ngwaahịa

Nkọwa

Tetramethylammonium hydroxide(TMAH ma ọ bụ TMAOH) bụ quaternary ammonium nnu nwere usoro ihe omimi [(CH)3)4N]+[OH]-, ma bụrụ onye kachasị mfe na klas nke ogige ammonium quaternary organic.Otu n'ime ụlọ ọrụ mmepụta ihe bụ maka anisotropic etching nke silicon.A na-ejikwa ya dị ka ihe mgbaze bụ isi na mmepe nke photoresist acidic na usoro fotolithography.Ebe ọ bụ ihe na-akpalite mbufe oge, ọ na-arụ ọrụ nke ukwuu n'iwepụ fotoresisist.A na-ejikwa ya dị ka surfactant na njikọ nke ferrofluid, iji gbochie agglomeration.

Nkọwapụta:

Aha ọgwụ Ngwọta Tetramethylammonium hydroxide
Aha ọzọ TMAH
CAS # 75-59-2
Ịdị ọcha 25% nkeji
Usoro ihe omimi (CH3) 4NOH
Ibu arọ molekụla 91.15
Njirimara kemịkalụ Mmiri na-acha odo odo na-enweghị agba na-acha odo odo. Ọ dị mfe ịnweta carbon dioxide, alkaline siri ike, na-emebi emebi.
Ngwa 1. Na-ebufe oge na-akpalite na organic sịntetik kemịkalụ.
2. Anisotropic corrosion ngwọta maka ụlọ ọrụ eletrọnịkị, na-eme ka polymerization nke silicone roba na ngwaahịa silicone ndị ọzọ.
Nkwakọ ngwaahịa 1KG, 25KG, 200kg, 1000KG IBC, ISO TANK

 

Mpempe akwụkwọ data nka na ụzụ/TDS:

Nkọwapụta Ihe Nkeji MIN MAX
  Nyocha % 24.90 25.10
  Agba Hazen   5
  CO32-(Carbonate) ppm   100
  Cl-(Kloride) ppm   0.1
  CH3OH (Methanol) ppm   40
  Li (Lithium) ppb   5
  Na (sodium) ppb   10
  Mg (Magnesium) ppb   5
  Al (aluminom) ppb   10
  K (Potassium) ppb   10
  Ca (calcium) ppb   10
  Cr (Chromium) ppb   5
  Mn (Manganese) ppb   5
  Fe (Iron) ppb   5
  Ni (Nickel) ppb   5
  Co (Cobalt) ppb   5
  Ku (ọla kọpa) ppb   5
  Zinc (Zin) ppb   5
  Mo (Molybdenum) ppb   5
  Cd (Cadmium) ppb   5
  Pb (ndu) ppb   5
  Ag (ọlaọcha) ppb   5
  Akụkụ> = 0.5um Ea/ml   100

 

Njirimara anụ ahụ* Ụdị Mmiri mmiri
  Ebe esi mmiri,°C 100.0
  Ebe oyi na-atụ, Celsius C <-25.0
  Viscosity @ 25 Celsius C, cst 2.8
  Nnukwu ike ndọda @ 60 Celsius F 1.022
  Flashpoint (Pensky Martens), Celsius F >200
  pH > 13

 

 

Ozi mbupu Akpa
  200L drum dị ọcha
  Akpa ndị ọzọ dị mgbe a rịọrọ ya.
  Nhazi mbupu
  Aha mbupu kwesịrị ekwesị: tetramethylammonium hydroxide
  Nkewa ihe egwu: 8
  Nọmba njirimara: UN1835, PGII

 

Nchekwa na njikwa Maka ozi nchekwa kpọmkwem na njikwa biko rụtụ aka na
  Mpempe akwụkwọ data nchekwa ihe dị na arịrịọ.

 

Okwu* Tetramethylammonium Hydroxide (2.380%,20.0%, eletrọnịkị ọkwa), TMAH (25%, 98%, ụlọ ọrụ ọkwa) dịkwa, biko kpọtụrụ anyị maka nkọwa.

Ngwa

1) N'akụkụ nke nyocha, tetramethylammonium Hydroxide nwere ike iji dị ka polarographic reagent.

2) N'ihe banyere ịdị ọcha ngwaahịa, a na-eji ya dị ka ash free alkali ka sedimenti ụfọdụ dara elementrị.

3) na ụlọ ọrụ eletrọnịkị, ọkachasị dị ka onye nrụpụta ezigbo onye nrụpụta, silicon wafer wet etchant na ngwọta dị ọcha maka usoro CMP.

4) na imepụta sekit agbakwunyere, ihe ngosi kristal mmiri, bọọdụ sekit e biri ebi, capacitors, sensọ, na ọtụtụ ihe elektrọn ndị ọzọ.

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Etiti oge

≤25kg: n'ime ụbọchị ọrụ atọ mgbe ugwo natara.

25kg: otu izu

Ihe atụ

Dị

ngwugwu

200kg kwa drum, 25kg kwa drum, ma ọ bụ dị ka ị chọrọ.

Nchekwa

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